Method to Measure Uniformity of Plasma Developed

 

-Using Optical Emission Spectroscopy

 

 

 

Professor Ilgu Yun and his research team from the Department of Electrical & Electronic Engineering have developed a method for measuring the uniformity of plasma using Optical Emission Spectroscopy (OES) with a special spatially resolved ring lens. The method allows for more accurate monitoring of semiconductor equipment that uses plasma.

 

According to Professor Yun: “The research is significant, as we have developed a lens that measures local light intensity according to distance.” He added: “With this newly-developed lens, we can diagnose the uniformity of plasma in process, and by measuring defects, it is likely that this method will contribute greatly to increasing yield and reducing investment.”

 

The research results were published in the September issue of IEEE Transactions on Industrial Electronics with the title “Plasma Process Uniformity Diagnosis Technique Using Optical Emission Spectroscopy with Spatially Resolved Ring Lens.”

 

The team has already obtained patent rights for the method in Korea with Samsung Electronics and is currently applying for a patent in the U.S.